Surface Science Facility
This facility is for a sample preparation and characterization system of the REIXS Beamline. The system consists of three chambers: MBE Chamber, Analysis Chamber and Transfer Chamber. A vacuum suitcase can be used to transfer samples under vacuum to RSXS endstation.
The MBE (Molecular Beam Epitaxy) Chamber can be used to grown various thin films or multilayers. The sources include:
- Luxel Radak Evaporation Furnace, up to 1500°C
- Omicron EFM3 Evaporator
- MBE-HTEZ High Temperatire Effusion Cell, 800 - 1700°C
- TC50 Thermal Cracker, for H2, O2, hydrides, halogens, HCs, NH3
The characterization tools on the MBE chamber include:
- RHEED, STAIB EK-30-R with KSA 400
- LEED, Omicron SPECTALEED
- Crystal Monitor
The Analysis Chamber is a characterization facility built by Omicron, with following capabilities:
- X-ray Photoelectron Spectroscopy (XPS) and Imaging XPS (IXPS)
- Ultraviolet Photoelectron Spectroscopy (UPS)
- Auger Electron Spectroscopy (AES)
- Electron Energy Loss Spectroscopy (EELS)
- Secondary Electron Detection (SED) Imaging
- Scanning Tunneling Microscope (STM), UHV
- Atomic Force Microscope (AFM), UHV
Following sources and detectors are available:
- Analyzer: Omicron SPHERA Energy Analyzer, 0 – 2000 eV, energy resolution 10meV
- Omicron Secondary Electron Detection (SED) System
- X-ray Source: Omicron DAR 400 X-ray Source, Mg / Al anode, 15kV, 20mA emission current
- X-ray Source: Omicron XM1000 Monochromated X-ray Source, Al anode, 15kV, 20mA emission current, energy line width 0.25eV.
- UV Source: HIS 13 High Intensity VUV source, for Helium, Neon, Argon, Krypton, Xenon and Hydrogen, discharge current 300 mA.
- Electron Gun Omicron EKF 1000 Electron Source, 100 – 5000 eV, maximum 10µA, LaB6 filament, spot size 1µm
- Electron Gun for EELS: Kimball Physics ELG-2A, 5 – 2000 eV, 1nA to 10µA, Barium Oxide Cathode, with X/Y deflection
- Flood gun: SPEC FG 15/40
- Omicron VT AFM XA Scanning Probe Microscope
The transfer chamber is used to transfer samples between Analysis Chamber, MBE Chamber and a Load Lock Chamber, in Ultra-High Vacuum.
- Sputtering Gun, can be used to sputter clean the sample surface
- A heater on the sample stage for sample annealing (up to 650°C)
Users with allocated beam time have priority to access this facility. The request to use this system alone should be directed to the Beamline Scientist.